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Kappertz, Oliver
Alternative names
Publications (10 of 23) Show all publications
Severin, D., Kappertz, O., Nyberg, T., Berg, S., Pflug, A. & Wüttig, M. (2009). Increase of the Deposition Rate in Reactive Sputtering of Metal Oxides using a Ceramic Nitride Target. Journal of Applied Physics, 105(9), 093302
Open this publication in new window or tab >>Increase of the Deposition Rate in Reactive Sputtering of Metal Oxides using a Ceramic Nitride Target
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2009 (English)In: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 105, no 9, p. 093302-Article in journal (Refereed) Published
Abstract [en]

We present a method to eliminate hysteresis effects and to increase the deposition rate for the reactive sputtering of metal oxides. This is achieved by using a ceramic nitride target in an argon-oxygen atmosphere. Although the use of a ceramic nitride target leads to   pronounced changes of the processing characteristics, incorporation of nitrogen into the growing film is very small. These observations can be theoretically predicted using an extension of Berg's model [S. Berg and   T. Nyberg, Thin Solid Films 476, 215 (2005)] to two different reactive gases and a compound target.

National Category
Physical Sciences Engineering and Technology
Identifiers
urn:nbn:se:uu:diva-121219 (URN)10.1063/1.3124380 (DOI)000266263300022 ()
Available from: 2010-03-19 Created: 2010-03-19 Last updated: 2017-12-12Bibliographically approved
Martin, D., Enlund, J., Kappertz, O. & Jensen, J. (2008). Comparing XPS and ToF-ERDA measurement of high-k dielectric materials. Journal of Physics, Conference Series, 100(1), 012036
Open this publication in new window or tab >>Comparing XPS and ToF-ERDA measurement of high-k dielectric materials
2008 (English)In: Journal of Physics, Conference Series, ISSN 1742-6588, E-ISSN 1742-6596, Vol. 100, no 1, p. 012036-Article in journal (Refereed) Published
National Category
Engineering and Technology Subatomic Physics
Research subject
Ion Physics
Identifiers
urn:nbn:se:uu:diva-111106 (URN)10.1088/1742-6596/100/1/012036 (DOI)000275655200036 ()
Available from: 2009-12-03 Created: 2009-12-03 Last updated: 2018-12-10Bibliographically approved
Severin, D., Sarakinos, K., Kappertz, O., Pflug, A. & Wuttig, M. (2008). Tailoring of structure formation and phase composition in reactively sputtered zirconium oxide films using nitrogen as an additional reactive gas. Journal of Applied Physics, 103(8), 083306
Open this publication in new window or tab >>Tailoring of structure formation and phase composition in reactively sputtered zirconium oxide films using nitrogen as an additional reactive gas
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2008 (English)In: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 103, no 8, p. 083306-Article in journal (Refereed) Published
Abstract [en]

The structure of ZrO2 films has been controlled during reactive sputtering in an argon/oxygen atmosphere by adding an amount of nitrogen gas to the process. Depending on the deposition conditions, amorphous, cubic, or monoclinic films have been obtained without any additional substrate heating. The resulting film structure is explained in terms of the control of fast negative oxygen ions generated at the target surface and accelerated toward the growing film. Furthermore, the nitrogen addition leads to a pronounced stabilization of the plasma discharge and fewer arcing events, while the incorporation of nitrogen atoms in the growing film is very small.

National Category
Engineering and Technology
Identifiers
urn:nbn:se:uu:diva-110214 (URN)10.1063/1.2903492 (DOI)000255456200031 ()
Available from: 2009-11-05 Created: 2009-11-05 Last updated: 2017-12-12Bibliographically approved
Martin, D., Enlund, J., Kappertz, O. & Jensen, J. (2007). Comparing XPS and ToF-ERDA measurement of high-k dielectric materials. In: : . Paper presented at 17th International Vacuum Conference (IVC-17), 13th International Conference on Surface science (ICSS-13), International Conference on Nanoscience and Technology 2007 (ICN+T 2007) Stockholm, Sweden, July 2-6 (2007) publ in Journal of Physics: Conference Series.
Open this publication in new window or tab >>Comparing XPS and ToF-ERDA measurement of high-k dielectric materials
2007 (English)Conference paper, Published paper (Refereed)
National Category
Engineering and Technology
Identifiers
urn:nbn:se:uu:diva-12732 (URN)
Conference
17th International Vacuum Conference (IVC-17), 13th International Conference on Surface science (ICSS-13), International Conference on Nanoscience and Technology 2007 (ICN+T 2007) Stockholm, Sweden, July 2-6 (2007) publ in Journal of Physics: Conference Series
Available from: 2008-01-11 Created: 2008-01-11 Last updated: 2016-04-11Bibliographically approved
Kubart, T., Polcar, T., Kappertz, O., Parreira, N., Nyberg, T., Berg, S. & Cavaleiro, A. (2007). Modelling of Magnetron Sputtering of Tungsten Oxide with Reactive Gas Pulsing. Plasma Processes and Polymers, 4, S522-S526
Open this publication in new window or tab >>Modelling of Magnetron Sputtering of Tungsten Oxide with Reactive Gas Pulsing
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2007 (English)In: Plasma Processes and Polymers, ISSN 1612-8850, Vol. 4, p. S522-S526Article in journal (Refereed) Published
Abstract [en]

Reactive sputtering is one of the most commonly employed processes for the deposition of thin films. However, the range of applications is limited by inherent instabilities, which necessitates the use of a complex feedback control of reactive gas (RG) partial pressure. Recently pulsing of the RG has been suggested as a possible alternative. In this report, the concept of periodically switching the RG flow between two different values is applied to the deposition of tungsten oxide. The trends in the measured time dependent RG pressure and discharge voltage are reproduced by a dynamical model developed for this process. Furthermore, the model predicts the compositional depth profile of the deposited film reasonably well, and in particular helps to understand the formation of the interfaces in the resulting multi-layer film.

Keywords
dynamic modelling, gas pulsing, reactive sputtering, tungsten oxide
National Category
Engineering and Technology
Identifiers
urn:nbn:se:uu:diva-142573 (URN)10.1002/ppap.200731301 (DOI)000207735200100 ()
Available from: 2011-01-14 Created: 2011-01-14 Last updated: 2016-04-11Bibliographically approved
Severin, D., Kappertz, O., Nyberg, T., Berg, S. & Wüttig, M. (2007). The Effect of Target Aging on the Structure Formation of Zinc Oxide During Reactive Sputtering. Thin Solid Films, 515(7-8), 3554-3558
Open this publication in new window or tab >>The Effect of Target Aging on the Structure Formation of Zinc Oxide During Reactive Sputtering
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2007 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 515, no 7-8, p. 3554-3558Article in journal (Refereed) Published
Abstract [en]

A comparative study of reactively sputtered zinc oxide films deposited using (a) a new metallic Zn target and (b) an old one with a pronounced erosion trace is presented. Depending on the shape of the target surface there, are pronounced differences in the film structure. These findings are attributed to a correlation between the target surface profile and ion bombardment of the growing film. Main candidates for the differences in film structure are negatively charged oxygen ions generated at the oxidized target surface.

Keywords
Reactive sputtering, Zinc oxide, Negative oxygen ions
National Category
Engineering and Technology
Identifiers
urn:nbn:se:uu:diva-10270 (URN)10.1016/j.tsf.2006.10.130 (DOI)000244825100037 ()
Available from: 2007-03-09 Created: 2007-03-09 Last updated: 2017-12-11
Kappertz, O., Kubart, T., Nyberg, T. & Berg, S. (2006). Advanced Process Modelling of the Rotating Magnetron. In: : . Paper presented at AVS 53rd International Symposium & Exhibition, San Francisco, USA, November 12-17.
Open this publication in new window or tab >>Advanced Process Modelling of the Rotating Magnetron
2006 (English)Conference paper, Published paper (Refereed)
National Category
Engineering and Technology
Identifiers
urn:nbn:se:uu:diva-25888 (URN)
Conference
AVS 53rd International Symposium & Exhibition, San Francisco, USA, November 12-17
Available from: 2007-02-14 Created: 2007-02-14 Last updated: 2016-07-12
Martin, D., Enlund, J., Kappertz, O. & Jensen, J. (2006). Compositional characterization of high-k dielectric material via XPS and ToF-ERDA. In: : . Paper presented at The AVS 53rd International Symposium, November 12-17, San Francisco, USA.
Open this publication in new window or tab >>Compositional characterization of high-k dielectric material via XPS and ToF-ERDA
2006 (English)Conference paper, Published paper (Other (popular science, discussion, etc.))
National Category
Engineering and Technology
Identifiers
urn:nbn:se:uu:diva-25568 (URN)
Conference
The AVS 53rd International Symposium, November 12-17, San Francisco, USA
Available from: 2007-03-08 Created: 2007-03-08 Last updated: 2016-07-12
Kubart, T., Kappertz, O., Nyberg, T. & Berg, S. (2006). Dynamic behaviour of the reactive sputtering process. Thin Solid Films, 515, 421-424
Open this publication in new window or tab >>Dynamic behaviour of the reactive sputtering process
2006 (English)In: Thin Solid Films, Vol. 515, p. 421-424Article in journal (Refereed) Published
National Category
Engineering and Technology
Identifiers
urn:nbn:se:uu:diva-84278 (URN)
Available from: 2006-11-14 Created: 2006-11-14 Last updated: 2016-06-23
Kubart, T., Kappertz, O., Nyberg, T. & Berg, S. (2006). Dynamic Modelling of Reactive Magnetron Sputtering. In: : . Paper presented at The Reactive Sputtering Deposition Symposium, Ghent, Belgium, November 30 - December 1.
Open this publication in new window or tab >>Dynamic Modelling of Reactive Magnetron Sputtering
2006 (English)Conference paper, Published paper (Refereed)
National Category
Engineering and Technology
Identifiers
urn:nbn:se:uu:diva-25838 (URN)
Conference
The Reactive Sputtering Deposition Symposium, Ghent, Belgium, November 30 - December 1
Available from: 2007-02-14 Created: 2007-02-14 Last updated: 2016-07-12
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