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Amorphous Carbon Films on Glass Prepared by Hollow Cathodes at Moderate Pressure
Uppsala universitet, Teknisk-naturvetenskapliga vetenskapsområdet, Tekniska sektionen, Institutionen för teknikvetenskaper, Elektricitetslära.
Uppsala universitet, Teknisk-naturvetenskapliga vetenskapsområdet, Tekniska sektionen, Institutionen för teknikvetenskaper, Elektricitetslära.
Uppsala universitet, Teknisk-naturvetenskapliga vetenskapsområdet, Tekniska sektionen, Institutionen för teknikvetenskaper, Elektricitetslära.ORCID-id: 0000-0002-1499-139X
2016 (engelsk)Inngår i: ECS Journal of Solid State Science and Technology, ISSN 2162-8769, E-ISSN 2162-8777, Vol. 5, nr 9, s. N57-N60Artikkel i tidsskrift (Fagfellevurdert) Published
sted, utgiver, år, opplag, sider
2016. Vol. 5, nr 9, s. N57-N60
HSV kategori
Identifikatorer
URN: urn:nbn:se:uu:diva-310693DOI: 10.1149/2.0311609jssISI: 000387983000006OAI: oai:DiVA.org:uu-310693DiVA, id: diva2:1057659
Prosjekter
EIT KIC InnoEnergy IncoTrans
Forskningsfinansiär
Swedish Energy AgencyTilgjengelig fra: 2016-12-19 Laget: 2016-12-19 Sist oppdatert: 2018-02-01
Inngår i avhandling
1. Plasma Enhanced Chemical- and Physical- Vapor Depositions Using Hollow Cathodes
Åpne denne publikasjonen i ny fane eller vindu >>Plasma Enhanced Chemical- and Physical- Vapor Depositions Using Hollow Cathodes
2018 (engelsk)Doktoravhandling, med artikler (Annet vitenskapelig)
Abstract [en]

Development of coating deposition technologies, in terms of performance and costs, is an ongoing process. A promising class of deposition technologies are based on hollow cathode discharges.

This thesis investigates performance of selected hollow cathode plasma sources developed at the Plasma group, at Uppsala University for coating deposition at moderate pressures. Amorphous carbon film deposition was investigated by Radio frequency (RF) Hollow Cathode Plasma Jet (RHCPJ) and Magnets-in-Motion (M-M) linear hollow cathode plasma sources. Titanium nitride (TiN) films were deposited by a magnetized Hollow Cathode Enhanced magnetron Target (HoCET). Aluminium nitride (AlN) deposition by RHCPJ was compared with High Power Impulse Magnetron Sputtering (HiPIMS).

Amorphous carbon films were prepared on glass substrates without an interlayer. The AlN and TiN films were deposited on Si substrates. Optical emission spectroscopy was used to analyze plasma composition. The coating structure was analyzed by X-ray diffraction and Raman spectroscopy. The thickness of films was measured by scanning electron microscopy and profilometry. The TiN hardness was analyzed by microhardness test method and confirmed by nanoindentation analysis.

Adherent amorphous carbon coating deposition process was transferred from RHCPJ to the M-M linear hollow cathode. Utilizing the latter plasma source, it was found that thick and adherent amorphous carbon coatings can be deposited in a range of 0.25% to 0.5% of C2H2 in Ar at constant a deposition pressure of 0.3 Torr and 1200 W of RF power. Deposition rates of 0.2 μm/min and 0.375 μm/min respectively were reached. Self-delaminating, thick (50 μm) amorphous carbon films can be deposited at a deposition rate of 2.5 μm/min at 2% C2H2. A non-linear relation was observed between the deposition rate and the C2H2 content.

Utilizing the HoCET arrangement, high deposition rates of stoichiometric, polycrystalline TiN films are obtained. A maximum of 0.125 μm/min is obtained at 2.4% N2 in Ar, 1200 W RF power, 14 mTorr deposition pressure. TiN films deposited at 4 - 20% nitrogen contents displayed hardness values above 28 GPa reaching a maximum of 31.4 GPa at 5% N2.

For a (002) oriented AlN film deposition the RHCPJ offers deposition rates of up to 150 nm/min. Using the HiPIMS at comparable deposition conditions the AlN films were achieved at a rate of 24 nm/min.

sted, utgiver, år, opplag, sider
Uppsala: Acta Universitatis Upsaliensis, 2018. s. 73
Serie
Digital Comprehensive Summaries of Uppsala Dissertations from the Faculty of Science and Technology, ISSN 1651-6214 ; 1629
Emneord
Hollow cathode, TiN, AlN, amorphous carbon, hybrid PVD/PE-CVD, ionized magnetron
HSV kategori
Identifikatorer
urn:nbn:se:uu:diva-340572 (URN)978-91-513-0230-0 (ISBN)
Disputas
2018-03-23, Polhemssalen (Ång/10134), Ångströmlaboratoriet, Lägerhyddsvägen 1, 75237, Uppsala, 09:15 (engelsk)
Opponent
Veileder
Prosjekter
EIT KIC InnoEnergy IncoTrans
Forskningsfinansiär
Swedish Energy Agency
Tilgjengelig fra: 2018-02-27 Laget: 2018-02-01 Sist oppdatert: 2018-04-03

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