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Industrial Scale Deposition of Diamond-like Carbon Thin Films using Ne-based HiPIMS Discharge
Uppsala universitet, Teknisk-naturvetenskapliga vetenskapsområdet, Tekniska sektionen, Institutionen för teknikvetenskaper, Fasta tillståndets elektronik. (Thin Film Physics)
Fraunhofer Institute for Surface Engineering and Thin Films, IST, Braunschweig, Germany.
Fraunhofer Institute for Surface Engineering and Thin Films, IST, Braunschweig, Germany.
Fraunhofer Institute for Surface Engineering and Thin Films, IST, Braunschweig, Germany.
Vise andre og tillknytning
2015 (engelsk)Konferansepaper, Poster (with or without abstract) (Annet vitenskapelig)
Abstract [en]

High power impulse magnetron sputtering (HiPIMS) has been successful in providing highly ionized deposition fluxes for most common metals (Cu, Al, Ti). However, it is challenged when non-metals such as carbon is considered. Highly ionized carbon fluxes (up to 100%) are essential for the synthesis of diamond-like carbon and tetrahedral amorphous carbon thin films. Earlier reports have shown that the C+/C0 ratio in HiPIMS does not exceed 5% and film densities and sp3/sp2 bond fractions are substantially lower than those achieved using ionized physical vapour deposition based methods such as filtered cathodic vacuum arc and pulsed laser deposition. In our previous work, we demonstrated that Ne-based HiPIMS discharge entails energetic electrons as compared to Ar-based HiPIMS discharge facilitating the generation of highly ionized C fluxes as well as diamond-like carbon thin films with mass densities in the order of 2.8 g/cm3

In this work, we perform industrial scale deposition of diamond-like carbon thin films using Ne- as well as Ar-based HiPIMS discharge. In order to investigate the effect of electron temperature enhancement and its correlation to generation of C1+ ion fluxes in Ne-based HiPIMS discharge, we perform time-averaged and time-resolved measurements of electron temperature as well as ion density at the substrate position using a flat probe. We also investigate the effect of plasma properties on the ionization of sputtered C as well as buffer gas species by measuring the optical emission from the discharge. In order to correlate the plasma and film properties, we synthesize C thin films under energetic deposition conditions and investigate structural (mass density, sp3/sp2 bond fraction, H content) and mechanical (hardness, elastic modulus, adhesion strength) properties of the resulting diamond-like carbon thin films.

sted, utgiver, år, opplag, sider
2015.
Emneord [en]
DLC; ta-C; carbon ionization; HiPIMS
HSV kategori
Forskningsprogram
Teknisk fysik med inriktning mot materialvetenskap
Identifikatorer
URN: urn:nbn:se:uu:diva-271240OAI: oai:DiVA.org:uu-271240DiVA, id: diva2:891459
Konferanse
6th International Conference on HiPIMS, June 2015, Braunshweig, Germany
Tilgjengelig fra: 2016-01-07 Laget: 2016-01-07 Sist oppdatert: 2016-04-22

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