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Surface Patterning by Heavy Ion Lithography Using Self-Assembled Colloidal Masks
Uppsala universitet, Teknisk-naturvetenskapliga vetenskapsområdet, Tekniska sektionen, Institutionen för teknikvetenskaper, Jonfysik.
Uppsala universitet, Teknisk-naturvetenskapliga vetenskapsområdet, Tekniska sektionen, Institutionen för teknikvetenskaper, Jonfysik.
2007 (engelsk)Inngår i: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, ISSN 0168-583X, E-ISSN 1872-9584, Vol. 257, nr 1-2, s. 777-781Artikkel i tidsskrift (Fagfellevurdert) Published
Abstract [en]

Heavy ion lithography using self-assembled colloidal particles as a mask enables micro- and nano-patterning of surfaces. The resulting patterns can be tuned by varying the mask configuration, i.e. packing geometry of the colloidal particles and number of particle layers. In this work we present several patterns, which can be transferred to rutile TiO2 single crystals by irradiating through self-assembled layers of silica micro-spheres with 25 MeV Br ions. As the induced ion tracks in TiO2 have a very high etching selectivity the patterns can be developed in HF with very high contrast. This makes it possible to prepare large patterned areas which can be of interest for e.g. optical applications.

sted, utgiver, år, opplag, sider
2007. Vol. 257, nr 1-2, s. 777-781
Emneord [en]
Ion tracks, TiO2, Ion lithography, Ion irradiation, Colloidal mask, Nano-patterning
HSV kategori
Identifikatorer
URN: urn:nbn:se:uu:diva-94959DOI: 10.1016/j.nimb.2007.01.099ISI: 000246165500175OAI: oai:DiVA.org:uu-94959DiVA, id: diva2:168993
Tilgjengelig fra: 2006-10-13 Laget: 2006-10-13 Sist oppdatert: 2017-12-14bibliografisk kontrollert
Inngår i avhandling
1. Nanopatterning by Swift Heavy Ions
Åpne denne publikasjonen i ny fane eller vindu >>Nanopatterning by Swift Heavy Ions
2006 (engelsk)Doktoravhandling, med artikler (Annet vitenskapelig)
Abstract [en]

Today, the dominating way of patterning nanosystems is by irradiation-based lithography (e-beam, DUV, EUV, and ions). Compared to the other irradiations, ion tracks created by swift heavy ions in matter give the highest contrast, and its inelastic scattering facilitate minute widening and high aspect ratios (up to several thousands). Combining this with high resolution masks it may have potential as lithography technology for nanotechnology. Even if this ‘ion track lithography’ would not give a higher resolution than the others, it still can pattern otherwise irradiation insensitive materials, and enabling direct lithographic patterning of relevant material properties without further processing. In this thesis ion tracks in thin films of polyimide, amorphous SiO2 and crystalline TiO2 were made. Nanopores were used as templates for electrodeposition of nanowires.

In lithography patterns are defined by masks. To write a nanopattern onto masks e-beam lithography is used. It is time-consuming since the pattern is written serially, point by point. An alternative approach is to use self-assembled patterns. In these first demonstrations of ion track lithography for micro and nanopatterning, self-assembly masks of silica microspheres and porous alumina membranes (PAM) have been used.

For pattern transfer, different heavy ions were used with energies of several MeV at different fluences. The patterns were transferred to SiO2 and TiO2. From an ordered PAM with pores of 70 nm in diameter and 100 nm inter-pore distances, the transferred, ordered patterns had 355 nm deep pores of 77 nm diameter for SiO2 and 70 nm in diameter and 1,100 nm deep for TiO2. The TiO2 substrate was also irradiated through ordered silica microspheres, yielding different patterns depending on the configuration of the silica ball layers.

Finally, swift heavy ion irradiation with high fluence (above 1015/cm2) was assisting carbon nanopillars deposition in a PAM used as template.

sted, utgiver, år, opplag, sider
Uppsala: Acta Universitatis Upsaliensis, 2006. s. 48
Serie
Digital Comprehensive Summaries of Uppsala Dissertations from the Faculty of Science and Technology, ISSN 1651-6214 ; 229
Emneord
Materials science, swift heavy ions, lithography, nanopatterning, self-assembly, Materialvetenskap
Identifikatorer
urn:nbn:se:uu:diva-7183 (URN)91-554-6676-1 (ISBN)
Disputas
2006-11-03, Siegbahns Salen, The Ångstöm Laboratory, Lägerhyddsvägen, Uppsala, 09:30
Opponent
Veileder
Tilgjengelig fra: 2006-10-13 Laget: 2006-10-13bibliografisk kontrollert

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