Films of In oxide and Sn oxyfluoride were made by magnetron sputtering and spray pyrolysis, respectively. Cyclic voltammetry on films in contact with an electrolyte, and atomic-force microscopy (AFM) on as-deposited films, showed that the fractal dimension obtained from the voltammetric peak-current technique is in excellent agreement with the fractal hillock distribution received via the mass-radius method applied to thresholded AFM images.