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Interaction of rhodium with hydroxylated alumina model substrates
Uppsala University.
Uppsala University.
Uppsala University.
Uppsala University.
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1997 (English)In: SURFACE SCIENCE, ISSN 0039-6028, Vol. 384, no 1-3, 106-119 p.Article in journal (Other scientific) Published
Abstract [en]

In order to investigate how metal growth and metal-oxide interaction depend on the chemical properties of oxide surfaces, we describe a modification procedure which allows the introduction of surface hydroxyl groups on a well-ordered Al2O3 film on NiAl(II

Place, publisher, year, edition, pages
ELSEVIER SCIENCE BV , 1997. Vol. 384, no 1-3, 106-119 p.
Keyword [en]
aluminum; aluminum oxide; chemisorption; growth; low energy electron diffraction; rhodium; soft X-ray photoelectron spectroscopy; water; CORE-LEVEL PHOTOEMISSION; STRUCTURAL CHARACTERIZATION; SYNCHROTRON-RADIATION; ELECTRON-DIFFRACTION; RH/AL2O3 CATALYST;
Identifiers
URN: urn:nbn:se:uu:diva-72568OAI: oai:DiVA.org:uu-72568DiVA: diva2:100479
Note
Addresses: Libuda J, MAX PLANCK GESELL, FRITZ HABER INST, FARADAYWEG 4-6, D-14195 BERLIN, GERMANY. LUND UNIV, DEPT SYNCHROTRON RADIAT, S-22100 LUND, SWEDEN. UNIV UPPSALA, DEPT PHYS, S-75121 UPPSALA, SWEDEN.Available from: 2008-10-17 Created: 2008-10-17 Last updated: 2011-01-15

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