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Laser-Assisted Atomic Layer Deposition of Boron Nitride Thin Films
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry, Inorganic Chemistry. oorganisk kemi.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry, Inorganic Chemistry. oorganisk kemi.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry, Inorganic Chemistry.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry, Inorganic Chemistry. oorganisk kemi.
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2005 (English)In: Chemical Vapor Deposition, Vol. 11, 330-337 p.Article in journal (Refereed) Published
Abstract [en]

Boron nitride thin films have been grown by both laser-assisted, and conventional atomic layer deposition (LALD/ALD) at temperatures in the range 250-750 °C. Both the NH3 and BBr3 precursors were appreciably dissociated by the ArF excimer laser, and up to 600 °C, the growth rate was 100 % higher for the LALD process than for ALD. The films consisted of hydrogen-terminated turbostratic BN grains. H2 was theoretically found to bind as strongly as BBrX and NHX (X = 0-2) to hBN(100) edges. The fresh films were stoichiometric with respect to B and N, and contained low degrees of contamination, but oxidized easily in air.

Place, publisher, year, edition, pages
2005. Vol. 11, 330-337 p.
Keyword [en]
Atomic layer deposition, Boron nitride, Thin films
National Category
Inorganic Chemistry
Identifiers
URN: urn:nbn:se:uu:diva-73974DOI: doi:10.1002/cvde.200506365OAI: oai:DiVA.org:uu-73974DiVA: diva2:101885
Available from: 2007-04-18 Created: 2007-04-18 Last updated: 2011-01-11

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Ottosson, MikaelCarlsson, Jan-OttoLarsson, Karin

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