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Growth of CNxHy films by reactive magnetron sputtering of carbon in Ar/NH3 discharges
Uppsala University.
Uppsala University.
Uppsala University.
Uppsala University.
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1996 (English)In: JOURNAL OF MATERIALS RESEARCH, Vol. 11, no 4, 981-988 p.Article in journal (Other scientific) Published
Abstract [en]

Results on hydrogenated carbon nitride (CNxHy) thin films grown by reactive magnetron sputtering in a mixed Ar/NH3 discharge are reported. Depending on the growth temperature (T-s) and negative substrate bias voltage (V-s), both the composition and the mi

Place, publisher, year, edition, pages
MATERIALS RESEARCH SOCIETY , 1996. Vol. 11, no 4, 981-988 p.
Keyword [en]
HYDROGEN
Identifiers
URN: urn:nbn:se:uu:diva-75059OAI: oai:DiVA.org:uu-75059DiVA: diva2:102969
Note
Addresses: Sjostrom H, LINKOPING UNIV, DEPT PHYS, S-58183 LINKOPING, SWEDEN. SUNY ALBANY, ALBANY, NY 12222. UNIV UPPSALA, DEPT PHYS, S-75121 UPPSALA, SWEDEN.Available from: 2008-10-17 Created: 2008-10-17 Last updated: 2011-01-15

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