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Kinetic behaviour of target poisoning during reactive sputtering
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
Physics, Department of Nuclear and Particle Physics. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillstånndets elektronik.
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2005 (English)In: Reactive Sputter Deposition 2005 in Delft, The Netherlands, 2005Conference paper, Published paper (Other scientific)
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2005.
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URN: urn:nbn:se:uu:diva-75896OAI: oai:DiVA.org:uu-75896DiVA: diva2:103807
Available from: 2006-03-10 Created: 2006-03-10

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Kappertz, OliverNyberg, TomasBerg, Sören

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