uu.seUppsala University Publications
Change search
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • ieee
  • modern-language-association
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf
CHEMICAL-VAPOR-DEPOSITION OF CR, MO AND W THIN-FILMS INDUCED BY SYNCHROTRON-RADIATION
Uppsala University.
Uppsala University.
Uppsala University.
Uppsala University.
1995 (English)In: VACUUM, ISSN 0042-207X, Vol. 46, no 8-10, 1165-1169 p.Article in journal (Other scientific) Published
Abstract [en]

We demonstrate the ability to produce 1000 Angstrom thick metal containing films by using chemical vapour deposition (CVD) from Cr(CO)(6), Mo(CO)(6) and W(CO)(6) induced by synchrotron radiation (SR). The deposition is monitored in real time and in situ u

Place, publisher, year, edition, pages
PERGAMON-ELSEVIER SCIENCE LTD , 1995. Vol. 46, no 8-10, 1165-1169 p.
Keyword [en]
RAY EMISSION-SPECTROSCOPY; ELECTRON-SPECTROSCOPY; MO(CO)6; SILICON; W(CO)6
Identifiers
URN: urn:nbn:se:uu:diva-76009OAI: oai:DiVA.org:uu-76009DiVA: diva2:103920
Note
Addresses: MANCINI DC, UNIV UPPSALA, DEPT PHYS, BOX 530, S-75121 UPPSALA, SWEDEN. UNIV UPPSALA, INST CHEM, S-75121 UPPSALA, SWEDEN.Available from: 2008-10-17 Created: 2008-10-17 Last updated: 2011-01-15

Open Access in DiVA

No full text

By organisation
Uppsala University

Search outside of DiVA

GoogleGoogle Scholar

urn-nbn

Altmetric score

urn-nbn
Total: 459 hits
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • ieee
  • modern-language-association
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf