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CHEMICAL-VAPOR-DEPOSITION OF CR, MO AND W THIN-FILMS INDUCED BY SYNCHROTRON-RADIATION
Uppsala University.
Uppsala University.
Uppsala University.
Uppsala University.
1995 (English)In: VACUUM, ISSN 0042-207X, Vol. 46, no 8-10, p. 1165-1169Article in journal (Other scientific) Published
Abstract [en]

We demonstrate the ability to produce 1000 Angstrom thick metal containing films by using chemical vapour deposition (CVD) from Cr(CO)(6), Mo(CO)(6) and W(CO)(6) induced by synchrotron radiation (SR). The deposition is monitored in real time and in situ u

Place, publisher, year, edition, pages
PERGAMON-ELSEVIER SCIENCE LTD , 1995. Vol. 46, no 8-10, p. 1165-1169
Keyword [en]
RAY EMISSION-SPECTROSCOPY; ELECTRON-SPECTROSCOPY; MO(CO)6; SILICON; W(CO)6
Identifiers
URN: urn:nbn:se:uu:diva-76009OAI: oai:DiVA.org:uu-76009DiVA, id: diva2:103920
Note
Addresses: MANCINI DC, UNIV UPPSALA, DEPT PHYS, BOX 530, S-75121 UPPSALA, SWEDEN. UNIV UPPSALA, INST CHEM, S-75121 UPPSALA, SWEDEN.Available from: 2008-10-17 Created: 2008-10-17 Last updated: 2011-01-15

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