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Effects of post-deposition annealing on the material characteristics of ultrathin HfO2 films on silicon
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Physics, Department of Physics and Materials Science, Experimental Physics. Mikrostrukturlaboratoriet.
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2005 (English)In: J Appl Phys, Vol. 97, no 2Article in journal (Refereed) Published
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2005. Vol. 97, no 2
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URN: urn:nbn:se:uu:diva-76028OAI: oai:DiVA.org:uu-76028DiVA: diva2:103939
Available from: 2007-04-25 Created: 2007-04-25 Last updated: 2011-01-11

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Lu, JunBlom, Hans-Olof

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