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Hollow Cathode Based Plasma Sources and Applications
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
2005 (English)In: Proceedings of the 15th Symp. on Applications and Plasma Processes and 3rd EU-Japan Joint Symp. on Plasma Processing (SAPP XV), Podbanské, Slovakia, January 2005, IL01, 2005, p. 19-22 p.Conference paper, Published paper (Other scientific)
Place, publisher, year, edition, pages
2005. p. 19-22 p.
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URN: urn:nbn:se:uu:diva-77003OAI: oai:DiVA.org:uu-77003DiVA: diva2:104915
Available from: 2006-03-10 Created: 2006-03-10

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Bardos, LadislavBarankova, Hana

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