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Properties of TiN Films Produced in Hollow Cathode and Microwave ECR Hybrid Plasma System
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
2005 (English)In: E-MRS Spring Meeting, Strasbourg, May-June 2005, Paper K-VII.3., 2005Conference paper, Published paper (Other scientific)
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2005.
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URN: urn:nbn:se:uu:diva-77006OAI: oai:DiVA.org:uu-77006DiVA: diva2:104918
Available from: 2006-03-10 Created: 2006-03-10

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Gustavsson, Lars-ErikBarankova, HanaBardos, Ladislav

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