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Ion Enchanced Plasma Etching of Metal Oxides in Chlorine Based Plasma
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
2005 (English)In: Presented at American Vacuum Society 52nd National Symposium 2005 in Boston, USA, 2005Conference paper, Published paper (Other scientific)
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2005.
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URN: urn:nbn:se:uu:diva-77059OAI: oai:DiVA.org:uu-77059DiVA: diva2:104971
Available from: 2006-03-10 Created: 2006-03-10

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Blom, Hans-Olof

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