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MAGNETIZATION AND MICROSTRUCTURE OF NI FILMS PREPARED BY DC MAGNETRON SPUTTERING
Uppsala University.
Uppsala University.
Uppsala University.
1995 (English)In: JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, ISSN 0304-8853, Vol. 140, 701-702 p.Article in journal (Other scientific) Published
Abstract [en]

We prepared Ni films, about 50 nm thick, by dc magnetron sputtering. Films deposited at room temperature have saturation magnetizations, M(s), significantly reduced below the value of bulk Ni. M(s) and the coercivity vary with the substrate temperature. T

Place, publisher, year, edition, pages
ELSEVIER SCIENCE BV , 1995. Vol. 140, 701-702 p.
Identifiers
URN: urn:nbn:se:uu:diva-77081OAI: oai:DiVA.org:uu-77081DiVA: diva2:104993
Note
Addresses: HANSON M, CHALMERS UNIV TECHNOL, DEPT PHYS, S-41296 GOTHENBURG, SWEDEN. UNIV GOTHENBURG, S-41296 GOTHENBURG, SWEDEN. UPPSALA UNIV, DEPT SOLID STATE PHYS, S-75121 UPPSALA, SWEDEN.Available from: 2008-10-17 Created: 2008-10-17 Last updated: 2011-01-15

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