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Age hardening in (Ti1-xAlx)B2+Delta thin films
Linkoping Univ, Dept Phys Chem & Biol IFM, Thin Film Phys Div, SE-58183 Linkoping, Sweden..
Linkoping Univ, Dept Phys Chem & Biol IFM, Thin Film Phys Div, SE-58183 Linkoping, Sweden..
Linkoping Univ, Dept Phys Chem & Biol IFM, Thin Film Phys Div, SE-58183 Linkoping, Sweden.;Max Planck Inst Eisenforsch GmbH, D-40237 Dusseldorf, Germany..
Uppsala University, Disciplinary Domain of Science and Technology, Chemistry, Department of Chemistry - Ångström, Inorganic Chemistry.
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2017 (English)In: Scripta Materialia, ISSN 1359-6462, E-ISSN 1872-8456, Vol. 127, 122-126 p.Article in journal (Refereed) Published
Abstract [en]

Thin films of (Ti0.71Al0.29)B2+1.08 have been deposited by magnetron sputtering. Post-deposition annealing at 1000 degrees C for 1 h results in increased hardness and elastic modulus, from 32 to 37 GPa and from 436 to 461 GPa, respectively. In both as-deposited and annealed states the films adhere well to the substrate, indicating no considerable internal stress. The initial high hardness is attributed to a columnar microstructure consisting of crystalline (Ti,Al)B-2 columns separated by an amorphous B matrix. The observed age hardening corresponds to phase separation within the (Ti,Al)B-2 columns including the formation of Ti-deficient crystallites within the grain interior upon annealing.

Place, publisher, year, edition, pages
2017. Vol. 127, 122-126 p.
Keyword [en]
Titanium diboride, Thin films, Mechanical properties, Hardness
National Category
Nano Technology Metallurgy and Metallic Materials
Identifiers
URN: urn:nbn:se:uu:diva-308614DOI: 10.1016/j.scriptamat.2016.09.021ISI: 000386407100028OAI: oai:DiVA.org:uu-308614DiVA: diva2:1050964
Funder
EU, FP7, Seventh Framework Programme, 258509Swedish Research Council, 621-2012-4425 642-2013-8020 621-2011-4417 330-2014-6336 622-2008-405 621-2012-4359Swedish Foundation for Strategic Research Knut and Alice Wallenberg Foundation, 2015.0043
Available from: 2016-11-30 Created: 2016-11-29 Last updated: 2016-11-30Bibliographically approved

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Berastegui, Pedro
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