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Chemical vapour deposition of hard a-C:H films from CH2I2
Uppsala University.
Uppsala University.
Uppsala University.
1997 (English)In: DIAMOND AND RELATED MATERIALS, Vol. 6, no 9, 1143-1151 p.Other (Other scientific)
Abstract [en]

Hydrogen containing amorphous carbon (a-C:H) films were deposited on Si(100) substrates by thermal decomposition of CH2I2. The coatings were hard, smooth, adherent and had a density of 1.8 g cm(-3). The temperature dependence of the deposition process wa

Place, publisher, year, pages
ELSEVIER SCIENCE SA LAUSANNE , 1997. Vol. 6, no 9, 1143-1151 p.
Keyword [en]
amorphous carbon; carbon; characterization; chemical vapour deposition; DIAMOND-LIKE CARBON; SURFACE; SPECTRA; PLASMA
Identifiers
URN: urn:nbn:se:uu:diva-77769OAI: oai:DiVA.org:uu-77769DiVA: diva2:105681
Note
Addresses: UNIV UPPSALA, INST CHEM, THIN FILM & SURFACE CHEM GRP, S-75121 UPPSALA, SWEDEN.Available from: 2008-10-17 Created: 2008-10-17

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