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Amorphous Carbon Films on Glass Prepared by Hollow Cathodes at Moderate Pressure
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.ORCID iD: 0000-0002-1499-139X
2016 (English)In: ECS Journal of Solid State Science and Technology, ISSN 2162-8769, E-ISSN 2162-8777, Vol. 5, no 9, N57-N60 p.Article in journal (Refereed) Published
Abstract [en]

Amorphous carbon coatings were prepared using the rf powered cylindrical and linear hollow cathodes. The hybrid deposition process combines both the Plasma Enhanced Chemical Vapor Deposition (PE CVD) and Physical Vapor Deposition (PVD). A cylindrical graphite nozzle and/or graphite plates were used as hollow cathode targets. The gas mixture used in the deposition process was argon with acetylene. The effect of the rf power as well as of pressure and gas mixture on the deposition rate and properties of the coatings is evaluated. The deposition rates of the coatings can reach high values and even thick coatings do not exhibit delamination.

Place, publisher, year, edition, pages
2016. Vol. 5, no 9, N57-N60 p.
National Category
Physical Sciences Engineering and Technology
Identifiers
URN: urn:nbn:se:uu:diva-310693DOI: 10.1149/2.0311609jssISI: 000387983000006OAI: oai:DiVA.org:uu-310693DiVA: diva2:1057659
Funder
Swedish Energy Agency
Available from: 2016-12-19 Created: 2016-12-19 Last updated: 2016-12-19Bibliographically approved

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Barankova, HanaBardos, LadislavSilins, Kaspars
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