Amorphous Carbon Films on Glass Prepared by Hollow Cathodes at Moderate Pressure
2016 (English)In: ECS Journal of Solid State Science and Technology, ISSN 2162-8769, E-ISSN 2162-8777, Vol. 5, no 9, N57-N60 p.Article in journal (Refereed) Published
Amorphous carbon coatings were prepared using the rf powered cylindrical and linear hollow cathodes. The hybrid deposition process combines both the Plasma Enhanced Chemical Vapor Deposition (PE CVD) and Physical Vapor Deposition (PVD). A cylindrical graphite nozzle and/or graphite plates were used as hollow cathode targets. The gas mixture used in the deposition process was argon with acetylene. The effect of the rf power as well as of pressure and gas mixture on the deposition rate and properties of the coatings is evaluated. The deposition rates of the coatings can reach high values and even thick coatings do not exhibit delamination.
Place, publisher, year, edition, pages
2016. Vol. 5, no 9, N57-N60 p.
Physical Sciences Engineering and Technology
IdentifiersURN: urn:nbn:se:uu:diva-310693DOI: 10.1149/2.0311609jssISI: 000387983000006OAI: oai:DiVA.org:uu-310693DiVA: diva2:1057659
FunderSwedish Energy Agency