uu.seUppsala University Publications
Change search
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • ieee
  • modern-language-association
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf
Formation of Silicide Films by Ion Beam Deposition
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Ion Physics. Jonfysik.
Show others and affiliations
2005 (English)In: Nucl. Inst. and Methods in Phys Res, no B242, 602- p.Article in journal (Refereed) Published
Place, publisher, year, edition, pages
2005. no B242, 602- p.
Identifiers
URN: urn:nbn:se:uu:diva-78575OAI: oai:DiVA.org:uu-78575DiVA: diva2:106488
Available from: 2006-03-24 Created: 2006-03-24 Last updated: 2011-01-11

Open Access in DiVA

No full text

Authority records BETA

Possnert, Göran

Search in DiVA

By author/editor
Possnert, Göran
By organisation
Department of Engineering SciencesIon Physics

Search outside of DiVA

GoogleGoogle Scholar

urn-nbn

Altmetric score

urn-nbn
Total: 533 hits
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • ieee
  • modern-language-association
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf