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Area selective laser chemical vapor deposition of diamond and graphite
Uppsala University.
Uppsala University.
Uppsala University.
1997 (English)In: APPLIED SURFACE SCIENCE, Vol. 110, 462-466 p.Other (Other scientific)
Abstract [en]

High quality diamond and graphite has been deposited area selectively on silicon substrates in a hot filament chemical vapor deposition reactor employing laser heating. A mixture of CH4 (1-3 vol%) and H-2 was passed over a tantalum filament having a temp

Place, publisher, year, pages
ELSEVIER SCIENCE BV , 1997. Vol. 110, 462-466 p.
Identifiers
URN: urn:nbn:se:uu:diva-80675OAI: oai:DiVA.org:uu-80675DiVA: diva2:108589
Note
Addresses: Lindstam M, UNIV UPPSALA, DEPT INORGAN CHEM, BOX 531, S-75121 UPPSALA, SWEDEN.Available from: 2008-10-17 Created: 2008-10-17

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