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Re-Investigation of Cobalt Porphyrin for Electrochemical Water Oxidation on FTO Surface: Formation of CoOx as Active Species
KTH Royal Inst Technol, Sch Chem Sci & Engn, Dept Chem, S-10044 Stockholm, Sweden..
KTH Royal Inst Technol, Sch Chem Sci & Engn, Dept Chem, S-10044 Stockholm, Sweden..
KTH Royal Inst Technol, Sch Chem Sci & Engn, Dept Chem, S-10044 Stockholm, Sweden..
Uppsala University, Disciplinary Domain of Science and Technology, Physics, Department of Physics and Astronomy, Molecular and Condensed Matter Physics.
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2017 (English)In: ACS Catalysis, ISSN 2155-5435, E-ISSN 2155-5435, Vol. 7, no 2, 1143-1149 p.Article in journal (Refereed) Published
Abstract [en]

The use of cobalt porphyrin complexes as efficient and cost-effective molecular catalysts for water oxidation has been investigated previously. However, by combining a set of analytical techniques (electrochemistry, ultraviolet-visible spectroscopy (UV-vis), scanning electron microscopy (SEM), energy-dispersive X-ray spectroscopy (EDS), and synchrotron-based photoelectron spectroscopy (SOXPES and HAXPES)), we have demonstrated that three different cobalt porphyrins, deposited on FTO glasses, decompose promptly into a thin film of CoOx on the surface of the electrode during water oxidation under certain conditions (borate buffer pH 9.2). It is presumed that the film is composed of CoO, only detectable by SOXPES, as conventional techniques are ineffective. This newly formed film has a high turnover frequency (TOF), while the high transparency of the CoOx-based electrode is very promising for future application in photoelectrochemical cells.

Place, publisher, year, edition, pages
2017. Vol. 7, no 2, 1143-1149 p.
Keyword [en]
water oxidation, cobalt oxide, decomposition, surface characterization, thin film
National Category
Physical Chemistry
Identifiers
URN: urn:nbn:se:uu:diva-317954DOI: 10.1021/acscatal.6b01815ISI: 000393539200026OAI: oai:DiVA.org:uu-317954DiVA: diva2:1086249
Available from: 2017-03-31 Created: 2017-03-31 Last updated: 2017-03-31Bibliographically approved

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Philippe, BertrandChen, HongAhmadi, SarehRensmo, Håkan
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