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Non-reactively sputtered ultra-high temperature Hf-C and Ta-C coatings
TU Wien, Inst Mat Sci & Technol, A-1060 Vienna, Austria..
TU Wien, Inst Mat Sci & Technol, A-1060 Vienna, Austria..
TU Wien, Inst Mat Sci & Technol, A-1060 Vienna, Austria..
Uppsala University, Disciplinary Domain of Science and Technology, Physics, Department of Physics and Astronomy, Applied Nuclear Physics.
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2017 (English)In: Surface & Coatings Technology, ISSN 0257-8972, E-ISSN 1879-3347, Vol. 309, 436-444 p.Article in journal (Refereed) Published
Abstract [en]

Transition metal carbides are known for their exceptional thermal stability and mechanical properties, notably governed by the carbon content and the prevalent vacancies on the non-metallic sublattice. However, when using reactive deposition techniques, the formation of amorphous C-containing phases is often observed. Here, we show that non-reactive magnetron sputtering of HfC0.89 or TaC0.92 targets lead to fully crystalline coatings. Their C content depends on the target-to-substrate alignment and globally increases from HfC0.66 to HfC0.76 and from TaC0.69 to TaC0.75 with increasing bias potential from floating to - 100 V, respectively, when using a substrate temperature T-sub of 500 degrees C. Increasing T-sub to 700 degrees C leads to variations from TaC0.71 to TaC0.81. All HfCy films are single-phase face-centered cubic, whereas the TaCy films also contain small fractions of the hexagonal Ta2C phase. The highest hardness and indentation modulus among all coatings studied is obtained for TaC0.75 with H = 41.9 +/- 03 GPa and E = 466.8 +/- 15 GPa. Ab initio calculations predict an easy formation of vacancies on the C-sublattice, especially in the Ta-C system, and a temperature driven stabilization of defected structures at high temperatures, with fewer vacancies on the C sublattice for Hf-C than for Ta-C The predicted phase stability is proven up to 2400 C for both systems by annealing experiments in vacuum.

Place, publisher, year, edition, pages
ELSEVIER SCIENCE SA , 2017. Vol. 309, 436-444 p.
Keyword [en]
HfC, TaC, Non-reactive sputter deposition, Vacancies, UHTC, Density Functional Theory (DFT)
National Category
Condensed Matter Physics
Identifiers
URN: urn:nbn:se:uu:diva-319134DOI: 10.1016/j.surfcoat.2016.11.073ISI: 000396184400051OAI: oai:DiVA.org:uu-319134DiVA: diva2:1086257
Available from: 2017-03-31 Created: 2017-03-31 Last updated: 2017-04-07Bibliographically approved

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