uu.seUppsala University Publications
Change search
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf
Structural and magnetic properties of Co-N thin films deposited using magnetron sputtering at 523 K
UGC DAE Consortium Sci Res, Univ Campus,Khandwa Rd, Indore 452001, Madhya Pradesh, India..
UGC DAE Consortium Sci Res, Univ Campus,Khandwa Rd, Indore 452001, Madhya Pradesh, India..
Inst Engn & Technol DAVV, Khandwa Rd, Indore 452017, Madhya Pradesh, India..
UGC DAE Consortium Sci Res, Kokilamedu 603104, Tamil Nadu, India..
Show others and affiliations
2017 (English)In: Journal of Alloys and Compounds, ISSN 0925-8388, E-ISSN 1873-4669, Vol. 694, 1209-1213 p.Article in journal (Refereed) Published
Abstract [en]

In this work, we studied cobalt nitride (Co-N) thin films deposited using a dc magnetron sputtering method at a substrate temperature (T-s) of 523 K. We find that independent of the reactive gas flow (R-N2) used during sputtering, the phases of Co-N formed at this temperature seems to be identical having N at.% similar to 5. This is contrary to Co-N phases formed at lower T-s. For example at T-s similar to 300 K, an evolution of Co-N phases starting from Co(N) -> Co4N -> Co-3 N -> CoN can be seen as R-N2 increases gradually to 100%, whereas when T-s increases to 523 K, the phase formed is fcc Co along with a minuscule Co4N phase for R-N2 >= 25%. We used x-ray diffraction (XRD) to probe long range ordering, x-ray absorption spectroscopy (XAS) at Co absorption edge for the local structure, Magneto-optical Kerr effect (MOKE) and polarized neutron reflectivity (PNR) to measure the magnetization of samples. Quantification of N at.% was done using secondary ion mass spectroscopy (SIMS). Measurements suggest that the magnetic moment of Co N samples deposited at 523 K is slightly higher than the bulk Co moment and does not get affected with the R-N2 used for reactive sputtering. Our results provide an important insight about the phase formation of Co-N thin films which is discussed in this work.

Place, publisher, year, edition, pages
2017. Vol. 694, 1209-1213 p.
Keyword [en]
Cobalt nitride thin films, Tetra cobalt nitride, Reactive nitrogen sputtering
National Category
Chemical Sciences Physical Sciences
Identifiers
URN: urn:nbn:se:uu:diva-313922DOI: 10.1016/j.jallcom.2016.10.095ISI: 000390622900156OAI: oai:DiVA.org:uu-313922DiVA: diva2:1087098
Available from: 2017-04-05 Created: 2017-04-05 Last updated: 2017-04-05Bibliographically approved

Open Access in DiVA

No full text

Other links

Publisher's full text
By organisation
Department of Physics and Astronomy
In the same journal
Journal of Alloys and Compounds
Chemical SciencesPhysical Sciences

Search outside of DiVA

GoogleGoogle Scholar

Altmetric score

Total: 165 hits
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf