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Formation of nickel germanides from Ni layers with thickness below 10 nm
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.ORCID iD: 0000-0003-2679-2387
Uppsala University, Disciplinary Domain of Science and Technology, Physics, Department of Physics and Astronomy, Applied Nuclear Physics.ORCID iD: 0000-0002-5815-3742
KTH Royal Inst Technol, Sch Informat & Commun Technol, SE-16440 Kista, Sweden..
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2017 (English)In: Journal of Vacuum Science & Technology B, ISSN 1071-1023, E-ISSN 1520-8567, Vol. 35, no 2, article id 020602Article in journal (Refereed) Published
Abstract [en]

The authors have studied the reaction between a Ge (100) substrate and thin layers of Ni ranging from 2 to 10 nm in thickness. The formation of metal-rich Ni5Ge3 was found to precede that of the monogermanide NiGe by means of real-time in situ x-ray diffraction during ramp-annealing and ex situ x-ray pole figure analyses for phase identification. The observed sequential growth of Ni5Ge3 and NiGe with such thin Ni layers is different from the previously reported simultaneous growth with thicker Ni layers. The phase transformation from Ni5Ge3 to NiGe was found to be nucleationcontrolled for Ni thicknesses < 5 nm, which is well supported by thermodynamic considerations. Specifically, the temperature for the NiGe formation increased with decreasing Ni (rather Ni5Ge3) thickness below 5 nm. In combination with sheet resistance measurement and microscopic surface inspection of samples annealed with a standard rapid thermal processing, the temperature range for achieving morphologically stable NiGe layers was identified for this standard annealing process. As expected, it was found to be strongly dependent on the initial Ni thickness.

Place, publisher, year, edition, pages
A V S AMER INST PHYSICS , 2017. Vol. 35, no 2, article id 020602
National Category
Materials Engineering
Identifiers
URN: urn:nbn:se:uu:diva-320866DOI: 10.1116/1.4975152ISI: 000397858500029OAI: oai:DiVA.org:uu-320866DiVA, id: diva2:1091225
Funder
Swedish Foundation for Strategic Research , SE13-0033 RIF14-0053Swedish Research Council, C0514401Available from: 2017-04-26 Created: 2017-04-26 Last updated: 2018-04-11Bibliographically approved

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Jablonka, LukasKubart, TomasPrimetzhofer, DanielZhang, Shi-LiZhang, Zhen

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