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Is Imitation Really the Sincerest Form of Flattery? Protection for Fashion Designs in the United States and Europe: The relationship between design piracy and digital technologies
Uppsala University, Disciplinary Domain of Humanities and Social Sciences, Faculty of Law, Department of Law.
2016 (English)Independent thesis Advanced level (degree of Master (One Year)), 20 credits / 30 HE creditsStudent thesis
Place, publisher, year, edition, pages
2016.
National Category
Law
Identifiers
URN: urn:nbn:se:uu:diva-325541OAI: oai:DiVA.org:uu-325541DiVA: diva2:1115139
Educational program
Master Programme in Intellectual Property Law
Supervisors
Examiners
Available from: 2017-06-26 Created: 2017-06-26 Last updated: 2017-06-26Bibliographically approved

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CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf