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Effect of gas and cathode material on the r.f. hollow cathode reactive PVD
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
1999 (English)In: SURFACE & COATINGS TECHNOLOGY, ISSN 0257-8972, Vol. 121, 704-708 p.Article in journal (Refereed) Published
Abstract [en]

The process of generation of the radio frequency (r.f.) hollow cathode discharge was examined for different gases and different materials of the r.f. electrode. The delivered r.f. power range used in the experiments enabled analysis of the hollow cathode

Place, publisher, year, edition, pages
1999. Vol. 121, 704-708 p.
Keyword [en]
AlN; Al2O3; PVD; radio frequency hollow cathode discharge; DEPOSITION; TITANIUM
National Category
Other Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
URN: urn:nbn:se:uu:diva-84609OAI: oai:DiVA.org:uu-84609DiVA: diva2:112517
Note
Addresses: Barankova H, Univ Uppsala, Angstrom Lab, Box 534, S-75121 Uppsala, Sweden. Univ Uppsala, Angstrom Lab, S-75121 Uppsala, Sweden.Available from: 2007-02-28 Created: 2007-02-28 Last updated: 2011-01-14

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Barankova, HanaBardos, Ladislav

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