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Residual stress in sputtered gold films on quartz measured by the cantilever beam deflection technique
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Physics, Department of Physics and Materials Science, Materials Science. Department of Engineering Sciences, Electronics. Materialvetenskap.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Physics, Department of Physics and Materials Science, Materials Science. Department of Engineering Sciences, Electronics. Materialvetenskap.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Physics, Department of Physics and Materials Science, Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
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1999 (English)In: IEEE TRANSACTIONS ON ULTRASONICS FERROELECTRICS AND FREQUENCY CONTROL, ISSN 0885-3010, Vol. 46, no 4, 981-992 p.Article in journal (Refereed) Published
Abstract [en]

With resonator applications in mind, the residual stress in sputtered gold electrodes on quartz has been investigated with respect to various deposition rates (2, 10, and 50 Angstrom/s), pressures (1.0 and 3.0 . 10(-3) mbar), deposition temperatures (80 d

Place, publisher, year, edition, pages
1999. Vol. 46, no 4, 981-992 p.
Keyword [en]
THIN-FILMS; INTERNAL-STRESS; ALUMINUM; SILICON; METALLIZATIONS
Identifiers
URN: urn:nbn:se:uu:diva-84629OAI: oai:DiVA.org:uu-84629DiVA: diva2:112537
Note
Addresses: Thornell G, Univ Uppsala, Angstrom Lab, Box 534, SE-75121 Uppsala, Sweden. Univ Uppsala, Angstrom Lab, SE-75121 Uppsala, Sweden. Quartz Pro AB, SE-17506 Jarfalla, Sweden.Available from: 2007-02-28 Created: 2007-02-28 Last updated: 2011-01-14

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Thornell, GregerSchweitz, Jan-Åke

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