Residual stress in sputtered gold films on quartz measured by the cantilever beam deflection technique
1999 (English)In: IEEE TRANSACTIONS ON ULTRASONICS FERROELECTRICS AND FREQUENCY CONTROL, ISSN 0885-3010, Vol. 46, no 4, 981-992 p.Article in journal (Refereed) Published
With resonator applications in mind, the residual stress in sputtered gold electrodes on quartz has been investigated with respect to various deposition rates (2, 10, and 50 Angstrom/s), pressures (1.0 and 3.0 . 10(-3) mbar), deposition temperatures (80 d
Place, publisher, year, edition, pages
1999. Vol. 46, no 4, 981-992 p.
THIN-FILMS; INTERNAL-STRESS; ALUMINUM; SILICON; METALLIZATIONS
IdentifiersURN: urn:nbn:se:uu:diva-84629OAI: oai:DiVA.org:uu-84629DiVA: diva2:112537
Addresses: Thornell G, Univ Uppsala, Angstrom Lab, Box 534, SE-75121 Uppsala, Sweden. Univ Uppsala, Angstrom Lab, SE-75121 Uppsala, Sweden. Quartz Pro AB, SE-17506 Jarfalla, Sweden.2007-02-282007-02-282011-01-14