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Preferential sputtering effects in thin film processing
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
1999 (English)In: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, ISSN 0734-2101, Vol. 17, no 4, 1916-1925 p.Article in journal (Refereed) Published
Abstract [en]

Predicting the partial sputtering yield (sputtered atoms of one element/incident energetic ion) for different elements during sputtering from multielement targets:is not a straightforward task. It is commonly observed that ion bombardment of composite,tar

Place, publisher, year, edition, pages
1999. Vol. 17, no 4, 1916-1925 p.
Keyword [en]
ASSISTED SELECTIVE DEPOSITION; MONTE-CARLO SIMULATIONS; YIELD AMPLIFICATION; ION-BOMBARDMENT; EMISSION-ANGLE; DEPENDENCE; ISOTOPES; FLUENCE; TEMPERATURE; SEGREGATION
National Category
Other Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
URN: urn:nbn:se:uu:diva-84632OAI: oai:DiVA.org:uu-84632DiVA: diva2:112540
Note
Addresses: Berg S, Univ Uppsala, Angstrom Lab, Dept Solid State Elect, Box 534, S-75121 Uppsala, Sweden. Univ Uppsala, Angstrom Lab, Dept Solid State Elect, S-75121 Uppsala, Sweden.Available from: 2007-02-28 Created: 2007-02-28 Last updated: 2011-01-14

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Berg, SörenKatardjiev, Ilia

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