Atomic layer epitaxy of copper: an ab initio investigation of the CuCl/H-2 process - II. Reaction energies
1999 (English)In: APPLIED SURFACE SCIENCE, ISSN 0169-4332, Vol. 148, no 1-2, 9-16 p.Article in journal (Refereed) Published
Reaction energies for different reaction pathways in the CuCl/H-2 process occurring in the gas phase as well as on a Cu(111) surface have been calculated using Density Functional Theory. All reactions, occurring in the gas phase as well as in the solid/va
Place, publisher, year, edition, pages
1999. Vol. 148, no 1-2, 9-16 p.
density functional calculations; surface reactions; copper; copper(I) chloride; hydrogen; DISSOCIATIVE ADSORPTION; H-2; CU(111); DESORPTION; DYNAMICS; HYDROGEN; SURFACE; CU(100); MODEL
IdentifiersURN: urn:nbn:se:uu:diva-84634OAI: oai:DiVA.org:uu-84634DiVA: diva2:112542
Addresses: Larsson K, Ångström Lab, Box 538, SE-75121 Uppsala, Sweden.2006-10-192006-10-192011-01-14