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Thermal effects on the electrical degradation of thin film resistors
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science.
1999 (English)In: PHYSICA A, ISSN 0378-4371, Vol. 266, no 1-4, 214-217 p.Article in journal (Other scientific) Published
Abstract [en]

Recently we introduced a biased percolation model to study the electrical failure of thin-film resistors. Here we extend this model by allowing thermal interactions among first neighbour elemental resistances and accounting for the dependence of each elem

Place, publisher, year, edition, pages
ELSEVIER SCIENCE BV , 1999. Vol. 266, no 1-4, 214-217 p.
Keyword [en]
percolation models; 1/f electrical noise; thin film failure; BIASED PERCOLATION; 1/F NOISE; ELECTROMIGRATION; BREAKDOWN
Identifiers
URN: urn:nbn:se:uu:diva-84645OAI: oai:DiVA.org:uu-84645DiVA: diva2:112553
Note
Addresses: Pennetta C, Univ Lecce, Dipartimento Fis, Ist Nazl Fis Mat, Via Arnesano, I-73100 Lecce, Italy. Univ Lecce, Dipartimento Fis, Ist Nazl Fis Mat, I-73100 Lecce, Italy. Univ Lecce, Dipartimento Sci Mat, Ist Nazl Fis Mat, I-73100 Lecce, Italy. UnivAvailable from: 2008-10-17 Created: 2008-10-17 Last updated: 2011-01-14

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