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Ellipsometry on sputter-deposited tin oxide films: optical constants versus stoichiometry, hydrogen content, and amount of electrochemically intercalated lithium
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science.
1998 (English)In: APPLIED OPTICS, ISSN 0003-6935, Vol. 37, no 31, 7334-7341 p.Article in journal (Refereed) Published
Abstract [en]

Tin oxide thin films were deposited by reactive radio-frequency magnetron sputtering onto In2O3:Sn-coated and bare glass substrates. Optical constants in the 300-2500-nm wavelength range were determined by a combination of variable-angle spectroscopi

Place, publisher, year, edition, pages
OPTICAL SOC AMER , 1998. Vol. 37, no 31, 7334-7341 p.
Keyword [en]
ATOMIC-FORCE MICROSCOPY; EFFECTIVE-MEDIUM MODELS; SPECTROSCOPIC ELLIPSOMETRY; TRANSPARENT ELECTRODES; SURFACE-ROUGHNESS; SN OXIDE; ELECTROCHROMISM; REFLECTANCE; CAPACITY; INDEXES
Identifiers
URN: urn:nbn:se:uu:diva-84668OAI: oai:DiVA.org:uu-84668DiVA: diva2:112576
Note
Addresses: Isidorsson J, Univ Uppsala, Angstrom Lab, Dept Mat Sci, POB 534, S-75121 Uppsala, Sweden. Univ Uppsala, Angstrom Lab, Dept Mat Sci, S-75121 Uppsala, Sweden. Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA.Available from: 2008-10-17 Created: 2008-10-17 Last updated: 2011-01-14

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