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Optical constants of sputter-deposited Ti-Ce oxide and Zr-Ce oxide films
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science.
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1998 (English)In: APPLIED OPTICS, ISSN 0003-6935, Vol. 37, no 25, 5993-6001 p.Article in journal (Refereed) Published
Abstract [en]

Films of Ti oxide, Zr oxide, Ce oxide, Ti-Ce oxide, and Zr-Ce oxide were made by means of reactive de magnetron sputtering in a multitarget arrangement. The films were characterized by x-ray diffraction and electrochemical measurements, both technique

Place, publisher, year, edition, pages
OPTICAL SOC AMER , 1998. Vol. 37, no 25, 5993-6001 p.
Keyword [en]
ION-ASSISTED DEPOSITION; ELECTROCHROMIC TUNGSTEN-OXIDE; ZIRCONIA THIN-FILMS; CERIUM DIOXIDE; ELECTROCHEMICAL PROPERTIES; SUBSTRATE-TEMPERATURE; ABSORPTION; COATINGS; INTERCALATION; EVAPORATION
Identifiers
URN: urn:nbn:se:uu:diva-84679OAI: oai:DiVA.org:uu-84679DiVA: diva2:112587
Note
Addresses: Veszelei M, Univ Uppsala, Angstrom Lab, Dept Mat Sci, POB 534, S-75121 Uppsala, Sweden. Univ Uppsala, Angstrom Lab, Dept Mat Sci, S-75121 Uppsala, Sweden. Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA.Available from: 2008-10-17 Created: 2008-10-17 Last updated: 2011-01-14

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