Composition control by current modulation in dc-reactive sputtering
1998 (English)In: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, ISSN 0734-2101, Vol. A16, no 3, 1868-1872 p.Article in journal (Refereed) Published
Control of the reactive sputtering process can be carried out by controlling either the flow of the reactive gas or the power supplied to the target. In the flow control mode it is well known that the reactive sputter deposition process exhibits a pronoun
Place, publisher, year, edition, pages
1998. Vol. A16, no 3, 1868-1872 p.
Other Electrical Engineering, Electronic Engineering, Information Engineering
IdentifiersURN: urn:nbn:se:uu:diva-84694OAI: oai:DiVA.org:uu-84694DiVA: diva2:112602
Addresses: Nyberg T, Univ Uppsala, Angstrom Lab, S-75121 Uppsala, Sweden. Univ Uppsala, Angstrom Lab, S-75121 Uppsala, Sweden.2007-03-012007-03-012011-01-14