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Thin film processing by the radio frequency hollow cathodes
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
1997 (English)In: SURFACE & COATINGS TECHNOLOGY, ISSN 0257-8972, Vol. 97, no 1-3, 723-728 p.Article in journal (Refereed) Published
Abstract [en]

The main features of the radio frequency (RF) hollow cathodes for thin film processing are summarized. The utilization of cylindrical RF hollow cathodes in both the plasma-enhanced chemical vapour deposition (PECVD) and the physical vapour deposition (PVD

Place, publisher, year, edition, pages
1997. Vol. 97, no 1-3, 723-728 p.
Keyword [en]
hollow cathode; radio frequency; thin film processing; RF PLASMA-JET; TIN FILMS; REACTIVE DEPOSITION; INTERNAL WALLS; DIAMOND; DISCHARGE; VAPOR; TUBES
National Category
Other Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
URN: urn:nbn:se:uu:diva-84700OAI: oai:DiVA.org:uu-84700DiVA: diva2:112608
Note
Addresses: Bardos L, Uppsala Univ, Angstrom Consortium Thin film Proc, Dept Technol, Box 534, S-75121 Uppsala, Sweden. Uppsala Univ, Angstrom Consortium Thin film Proc, Dept Technol, S-75121 Uppsala, Sweden.Available from: 2007-03-02 Created: 2007-03-02 Last updated: 2011-01-15

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Bardos, LadislavBarankova, HanaBerg, Sören

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