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Characterization of the linear arc discharge (LAD) source for film deposition
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
1997 (English)In: SURFACE & COATINGS TECHNOLOGY, ISSN 0257-8972, Vol. 94-5, no 1-3, 578-582 p.Article in journal (Refereed) Published
Abstract [en]

The linear arc discharge (LAD) source is a parallel plate hollow cathode with a magnetic field perpendicular to the plates near the outlet slit of the cathode. The hollers cathode discharge is generated by radio frequency (rf) power and is confined mainly

Place, publisher, year, edition, pages
1997. Vol. 94-5, no 1-3, 578-582 p.
Keyword [en]
linear arc discharge; film deposition; HOLLOW-CATHODE DISCHARGE
National Category
Other Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
URN: urn:nbn:se:uu:diva-84705OAI: oai:DiVA.org:uu-84705DiVA: diva2:112613
Note
Addresses: Barankova H, Univ Uppsala, Angstrom Lab, Box 534, S-75121 Uppsala, Sweden. Univ Uppsala, Angstrom Lab, S-75121 Uppsala, Sweden.Available from: 2007-03-02 Created: 2007-03-02 Last updated: 2011-01-15

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Barankova, HanaBardos, LadislavBerg, Sören

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