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Diamond deposition in a microwave electrode discharge at reduced pressures
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
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1997 (English)In: DIAMOND AND RELATED MATERIALS, ISSN 0925-9635, Vol. 6, no 2-4, 224-229 p.Article in journal (Refereed) Published
Abstract [en]

Diamond deposition on healed Si-substrates was studied under microwave discharge generated by an electrode-antenna either in a ''point-to-plane'' arrangement or in a ''parallel-plane'' arrangement at gas pressures of 1-15 Torr in a mixture of hydrogen wit

Place, publisher, year, edition, pages
1997. Vol. 6, no 2-4, 224-229 p.
Keyword [en]
diamond deposition; microwave electrode discharge; reduced pressure; RF PLASMA-JET; CARBON
National Category
Other Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
URN: urn:nbn:se:uu:diva-84710OAI: oai:DiVA.org:uu-84710DiVA: diva2:112618
Note
Addresses: Bardos L, UNIV UPPSALA, DEPT TECHNOL, ANGSTROM CONSORTIUM THIN FILM PROC, BOX 534, S-75121 UPPSALA, SWEDEN. RUSSIAN ACAD SCI, INST PETROCHEM SYNTHESIS, MOSCOW 117072, RUSSIA.Available from: 2007-03-02 Created: 2007-03-02 Last updated: 2011-01-15

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Bardos, LadislavBarankova, HanaNyberg, TomasBerg, Sören

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