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Studies of reactive sputtering of multi-phase chromium nitride
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
Physics, Department of Physics. Department of Engineering Sciences, Electronics.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets fysik.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
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1997 (English)In: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, ISSN 0734-2101, Vol. 15, no 2, 248-252 p.Article in journal (Refereed) Published
Abstract [en]

We have presented a model for reactive sputter deposition of two-phase materials. This model has been applied to reactive sputtering of chromium nitride where it is assumed that either Cr2N or CrN is formed. In order to test the validity of the model, a n

Place, publisher, year, edition, pages
1997. Vol. 15, no 2, 248-252 p.
Keyword [en]
RAY EMISSION-SPECTROSCOPY; CHEMICAL-ANALYSIS; DEPOSITION; CRNX
National Category
Other Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
URN: urn:nbn:se:uu:diva-84712OAI: oai:DiVA.org:uu-84712DiVA: diva2:112620
Note
Addresses: Nyberg T, UNIV UPPSALA, ANGSTROM CONSORTIUM, BOX 534, S-75121 UPPSALA, SWEDEN.Available from: 2007-03-05 Created: 2007-03-05 Last updated: 2011-01-15

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Nyberg, TomasGålnander, BjörnNordgren, JosephBerg, Sören

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