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Radio frequency hollow cathodes for the plasma processing technology
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
1996 (English)In: SURFACE & COATINGS TECHNOLOGY, ISSN 0257-8972, Vol. 86-87, no 1-3, 648-656 p.Article in journal (Refereed) Published
Abstract [en]

The present paper summarizes the main features of the hollow cathode discharges generated by a radio frequency (r.f.) instead of a d.c. held. The pressure of gas inside the hollow cathode is almost independent on the reactor pressure, which allows to gene

Place, publisher, year, edition, pages
1996. Vol. 86-87, no 1-3, 648-656 p.
Keyword [en]
rf hollow cathode discharge; plasma processing technology; CHEMICAL VAPOR-DEPOSITION; FILM DEPOSITION; TIN FILMS; JET; DISCHARGES; DIAMOND; SHEATH; SILICON; SYSTEM; FLOW
National Category
Other Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
URN: urn:nbn:se:uu:diva-84713OAI: oai:DiVA.org:uu-84713DiVA: diva2:112621
Note
Addresses: Bardos L, UNIV UPPSALA, DEPT TECHNOL, ANGSTROM CONSORTIUM THIN FILM PROC, BOX 534, S-75121 UPPSALA, SWEDEN.Available from: 2007-03-05 Created: 2007-03-05 Last updated: 2011-01-15

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