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The radio frequency hollow cathode plasma jet arc for the film deposition
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
1996 (English)In: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, ISSN 0734-2101, Vol. 14, no 6, 3033-3038 p.Article in journal (Refereed) Published
Abstract [en]

The radio frequency hollow cathode plasma jet (RPJ or RHCPJ) are discharge is studied for an activated reactive deposition of TiN films. The presence of low content of nitrogen in argon enables reaching the are regime at lower powers than in pure argon. T

Place, publisher, year, edition, pages
1996. Vol. 14, no 6, 3033-3038 p.
Keyword [en]
DISCHARGE; TITANIUM
National Category
Other Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
URN: urn:nbn:se:uu:diva-84717OAI: oai:DiVA.org:uu-84717DiVA: diva2:112625
Note
Addresses: Barankova H, UNIV UPPSALA, ANGSTROM CONSORTIUM THIN FILM PROC, S-75121 UPPSALA, SWEDEN.Available from: 2007-03-05 Created: 2007-03-05 Last updated: 2011-01-15

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Barankova, HanaBardos, LadislavBerg, Sören

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