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IN-SITU MONITORING OF HFCVD DIAMOND GROWTH ON NICKEL USING SOFT-X-RAY EMISSION-SPECTROSCOPY
Uppsala University.
Uppsala University.
Uppsala University.
Uppsala University.
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1995 (English)In: VACUUM, ISSN 0042-207X, Vol. 46, no 8-10, 1053-1054 p.Article in journal (Other scientific) Published
Abstract [en]

It is well known that by analysing the C-K-emission from low pressure grown diamond films that it is possible to extract information of the types of bonding present. A HFCVD reactor has been constructed which together with a small soft X-ray emission spec

Place, publisher, year, edition, pages
PERGAMON-ELSEVIER SCIENCE LTD , 1995. Vol. 46, no 8-10, 1053-1054 p.
Identifiers
URN: urn:nbn:se:uu:diva-84721OAI: oai:DiVA.org:uu-84721DiVA: diva2:112629
Note
Addresses: SKYTT P, UNIV UPPSALA, ANGSTROM CONSORTIUM THIN FILM PROC, BOX 530, S-75121 UPPSALA, SWEDEN.Available from: 2008-10-17 Created: 2008-10-17 Last updated: 2011-01-15

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