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Hysteresis effects in the sputtering process using two reactive gases
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
1995 (English)In: Thin Solid Films, ISSN 0040-6090, Vol. 260, no 2, 181-186 p.Article in journal (Refereed) Published
Abstract [en]

The reactive sputtering process involving two reactive gases has been investigated. Sputtering titanium in the presence of oxygen and nitrogen in argon was studied by means of optical emission and mass spectrometries. The experiments reveal the mechanism

Place, publisher, year, edition, pages
1995. Vol. 260, no 2, 181-186 p.
Keyword [en]
GLOW DISCHARGE MASS SPECTROSCOPY; GLOW DISCHARGE OPTICAL SPECTROSCOPY; SPUTTERING; TITANIUM
National Category
Other Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
URN: urn:nbn:se:uu:diva-84725OAI: oai:DiVA.org:uu-84725DiVA: diva2:112633
Note
Addresses: BARANKOVA H, UPPSALA UNIV, DEPT ELECTR, ANGSTROM CONSORTIUM THIN FILM PROC, BOX 534, S-75121 UPPSALA, SWEDEN. ERICSSON COMPONENTS AB, S-16481 KISTA, SWEDEN.Available from: 2007-03-07 Created: 2007-03-07 Last updated: 2011-01-15

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Barankova, HanaBerg, Sören

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