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Halide chemical vapor deposition of Bi4Ti3O12
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry, Inorganic Chemistry. oorganisk kemi.
1998 (English)In: Chemical Vapor Deposition, Vol. 4, 213-216 p.Article in journal (Refereed) Published
Abstract [en]

Bismuth titanate is an interesting ferroelectric material whose properties suggest applications in FETs and in displays. CVD has several advantages in preparing such materials, but a major issue is the selection of precursors. Commonly organometallics ar

Place, publisher, year, edition, pages
1998. Vol. 4, 213-216 p.
Keyword [en]
BISMUTH TITANATE FILMS; THIN-FILMS; SURFACE-MORPHOLOGY; EPITAXIAL-GROWTH
National Category
Inorganic Chemistry
Identifiers
URN: urn:nbn:se:uu:diva-84728OAI: oai:DiVA.org:uu-84728DiVA: diva2:112636
Note
Addresses: Hårsta A, Univ Uppsala, Dept Inorgan Chem, Angstrom Lab, Box 538, S-75121 Uppsala, Sweden.Available from: 2006-06-28 Created: 2006-06-28 Last updated: 2011-01-14

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