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Chemical vapor deposition stability diagram for the Bil(3)-O-2 system
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry, Inorganic Chemistry. oorganisk kemi.
1998 (English)In: Journal of Electrochemical Society, Vol. 145, 4234-4239 p.Article in journal (Refereed) Published
Abstract [en]

Several phases in the Bi-O system have been deposited by chemical vapor deposition on MgO(001) substrates. Bismuth iodide, BiI3, and oxygen were used as source materials. An experimental chemical vapor deposition stability diagram has been determined as

Place, publisher, year, edition, pages
1998. Vol. 145, 4234-4239 p.
Keyword [en]
THIN-FILMS; CVD; PHASE; BI2O3
National Category
Inorganic Chemistry
Identifiers
URN: urn:nbn:se:uu:diva-84732OAI: oai:DiVA.org:uu-84732DiVA: diva2:112640
Note
Addresses: Univ Uppsala, Dept Inorgan Chem, Angstrom Lab, Box 538 S-75121 Uppsala, Sweden.Available from: 2006-06-28 Created: 2006-06-28 Last updated: 2011-01-14

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Hårsta, Anders

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