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Epitaxial growth of TiO2 (rutile) thin films by halide CVD
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry, Inorganic Chemistry. oorganisk kemi.
1999 (English)In: Journal de Physique IV. France, Vol. 9, p. Pr8-381Article in journal (Refereed) Published
Abstract [en]

Thin films of TiO2 have been deposited on alpha-Al2O3 (0 1 2) substrates from TiI4 and O-2 using low pressure chemical vapour deposition. The TiO2 films were iodine-free and both the anatase and the rutile phase TiO2 could be deposited. The rutile phase
Place, publisher, year, edition, pages
1999. Vol. 9, p. Pr8-381
Keywords [en]
CHEMICAL-VAPOR-DEPOSITION
National Category
Inorganic Chemistry
Identifiers
URN: urn:nbn:se:uu:diva-84836OAI: oai:DiVA.org:uu-84836DiVA, id: diva2:112744
Note
Addresses: Univ Uppsala, Dept Inorgan Chem, Angstrom Lab, Box 538, S-75121 Uppsala, Sweden.Available from: 2006-06-28 Created: 2006-06-28 Last updated: 2011-01-14

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Hårsta, Anders

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