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CVD of ZrO2 using ZrI4 as metal precursor
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry, Inorganic Chemistry.
1999 (English)In: Journal de Physique IV. E D P Science, Vol. 9, p. P8487-491Article in journal (Refereed) Published
Abstract [en]

A new process for CVD of zirconium oxide is presented. With zirconium tetraiodide, ZrI4, and oxygen as starting materials, crystalline ZrO2 is deposited on Si(100) at lower temperatures than with the conventional halide processes. The films are smooth an
Place, publisher, year, edition, pages
1999. Vol. 9, p. P8487-491
Keywords [en]
CHEMICAL-VAPOR-DEPOSITION; FILMS
National Category
Inorganic Chemistry
Identifiers
URN: urn:nbn:se:uu:diva-84837OAI: oai:DiVA.org:uu-84837DiVA, id: diva2:112745
Note
Addresses: Univ Uppsala, Dept Inorgan Chem, Angstrom Lab, Box 538, S-75121 Uppsala, Sweden. Univ Uppsala, Dept Inorgan Chem, Angstrom Lab, S-75121 Uppsala, Sweden.Available from: 2006-06-28 Created: 2006-06-28 Last updated: 2011-01-14

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Hårsta, Anders

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