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Deposition of epitaxial titanium carbide films on MgO(001) and 6H-SiC(0001) by coevaporation of Ti and C-60
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry, Inorganic Chemistry. oorganisk kemi.
1999 (English)In: Journal of Materials Research, Vol. 14, no 4, p. 1589-1596Article in journal (Other scientific) Published
Abstract [en]

Epitaxial films of TiC1-x, (0.15 < x < 0.50) were deposited on MgO(001) and 6H-SiC(0001) at 250 and 400 degrees C by coevaporation of C-60 and Ti. Films deposited on MgO(001) were single-crystalline down to deposition temperatures of at least 250 degrees
Place, publisher, year, edition, pages
1999. Vol. 14, no 4, p. 1589-1596
Keywords [en]
OHMIC CONTACTS
National Category
Inorganic Chemistry
Identifiers
URN: urn:nbn:se:uu:diva-84839OAI: oai:DiVA.org:uu-84839DiVA, id: diva2:112747
Note
Addresses: Univ Uppsala, Dept Inorgan Chem, Angstrom Lab, POB 538, S-75121 Uppsala, Sweden. Univ Lund, Natl Ctr HREM, Dept Inorgan Chem 2, S-22100 Lund, Sweden.Available from: 2006-12-14 Created: 2006-12-14 Last updated: 2011-01-14

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