Precursor selection in halide CVD of oxides
1999 (English)In: Chemical Vapor Deposition. -Wiley-V C H Verlag GMBH, Vol. 5, 4191- p.Article in journal (Refereed) Published
The selection of source materials is a very important issue in CVD. The choice is determined by several parameters, including purity, vapor pressure, and thermal stability. A brief review is given of halide precursors for the CVD of oxides, especially fo
Place, publisher, year, edition, pages
1999. Vol. 5, 4191- p.
CHEMICAL-VAPOR-DEPOSITION; BI2SR2CACU2O8+X; SYSTEM
IdentifiersURN: urn:nbn:se:uu:diva-84847OAI: oai:DiVA.org:uu-84847DiVA: diva2:112755
Addresses: Hårsta A, Univ Uppsala, Dept Inorgan Chem, Angstrom Lab, Box 538, S-75121 Uppsala, Sweden.2006-06-282006-06-282011-01-14