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Precursor selection in halide CVD of oxides
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry, Inorganic Chemistry. oorganisk kemi.
1999 (English)In: Chemical Vapor Deposition. -Wiley-V C H Verlag GMBH, Vol. 5, p. 4191-Article in journal (Refereed) Published
Abstract [en]

The selection of source materials is a very important issue in CVD. The choice is determined by several parameters, including purity, vapor pressure, and thermal stability. A brief review is given of halide precursors for the CVD of oxides, especially fo

Place, publisher, year, edition, pages
1999. Vol. 5, p. 4191-
Keywords [en]
CHEMICAL-VAPOR-DEPOSITION; BI2SR2CACU2O8+X; SYSTEM
National Category
Inorganic Chemistry
Identifiers
URN: urn:nbn:se:uu:diva-84847OAI: oai:DiVA.org:uu-84847DiVA, id: diva2:112755
Note
Addresses: Hårsta A, Univ Uppsala, Dept Inorgan Chem, Angstrom Lab, Box 538, S-75121 Uppsala, Sweden.Available from: 2006-06-28 Created: 2006-06-28 Last updated: 2011-01-14

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