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Halide chemical vapour deposition of Ta2O5
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry, Inorganic Chemistry. oorganisk kemi.
1999 (English)In: Thin Solid Films, Vol. 344, 111-114 p.Article in journal (Refereed) Published
Abstract [en]

Tantalum oxide, Ta2O5, has a wide range of interesting properties, for instance, a high dielectric constant, protonic conductivity, low leakage current and the material is possibly electrochromic. Tantalum oxide thin films have been prepared using many d

Place, publisher, year, edition, pages
1999. Vol. 344, 111-114 p.
Keyword [en]
tantalum oxide; thin films; chemical vapour deposition; dielectric constant; OXIDE THIN-FILMS; ELECTRICAL-PROPERTIES; TANTALUM
National Category
Inorganic Chemistry
Identifiers
URN: urn:nbn:se:uu:diva-84863OAI: oai:DiVA.org:uu-84863DiVA: diva2:112771
Note
Addresses: Univ Uppsala, Angstrom Lab, Dept Inorgan Chem, Box 538, SE-75121 Uppsala, Sweden. Univ Uppsala, Angstrom Lab, Dept Inorgan Chem, SE-75121 Uppsala, Sweden.Available from: 2006-06-28 Created: 2006-06-28 Last updated: 2011-01-14

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Hårsta, Anders

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