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Anomalous Hall effect in ion-beam sputtered Co2FeAl full Heusler alloy thin films
Thin Film Laboratory, Department of Physics, Indian Institute of Technology Delhi, New Delhi 110016, India.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Physics.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Physics.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Physics.
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2017 (English)In: Journal of Magnetism and Magnetic Materials, ISSN 0304-8853, E-ISSN 1873-4766, Vol. 442, 288-294 p.Article in journal (Refereed) Published
Abstract [en]

Investigations of temperature dependent anomalous Hall effect and longitudinal resistivity in Co2FeAl (CFA) thin films grown on Si(1 0 0) at different substrate temperature Ts are reported. The scaling of the anomalous Hall conductivity (AHC) and the associated phenomenological mechanisms (intrinsic and extrinsic) are analyzed vis-à-vis influence of Ts. The intrinsic contribution to AHC is found to be dominating over the extrinsic one. The appearance of a resistivity minimum at low temperature necessitates the inclusion of quantum corrections on account of weak localization and electron-electron scattering effects whose strength reduces with increase in Ts. The study establishes that the optimization of Tsplays an important role in the improvement of atomic ordering which indicates the higher strength of spin-orbit coupling and leads to the dominant intrinsic contribution to AHC in these CFA full Heusler alloy thin films.

Place, publisher, year, edition, pages
Elsevier, 2017. Vol. 442, 288-294 p.
National Category
Physical Sciences Engineering and Technology
Identifiers
URN: urn:nbn:se:uu:diva-332481DOI: 10.1016/j.jmmm.2017.06.127OAI: oai:DiVA.org:uu-332481DiVA: diva2:1153191
Projects
Knut and Alice Wallenberg (KAW) Foundation, Grant No. KAW 2012.0031
Available from: 2017-10-27 Created: 2017-10-27 Last updated: 2017-11-01

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Publisher's full texthttps://doi.org/10.1016/j.jmmm.2017.06.127

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