uu.seUppsala University Publications
Change search
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • ieee
  • modern-language-association
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf
Anomalous diffusion of ions in electrochromic tungsten oxide films
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Physics.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Physics.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Physics.ORCID iD: 0000-0002-8279-5163
2017 (English)In: Electrochimica Acta, ISSN 0013-4686, E-ISSN 1873-3859, Vol. 247, 252-257 p.Article in journal (Refereed) Published
Abstract [en]

Amorphous tungsten oxide thinfilms were deposited by sputtering at different O2/Ar ratios onto conducting substrates. Ion intercalation and diffusion in thefilms was studied by electrochemical impedance spectroscopy measurements in the frequency range 10 mHz–100 kHz and for potentials between 1.0 and 3.2 V vs. Li/Li+, using the film as working electrode in a Li+ containing electrolyte. The impedance data were in very good agreement with anomalous diffusion models. Different models were found to be applicable at potentials >1.8 V and <1.8 V. At high potentials ion intercalation was found to be reversible and an anomalous diffusion model describing ion hopping was favored. At low potentials ion intercalation was found to be irreversible and ion trapping takes place. In this latter range an anomalous diffusion model for the case of non-conserved number of charge carriers gave the best fit to experimentaldata. We obtained potential dependent diffusion coefficients in the range from 109 to 1011cm2/s, and anomalous diffusion exponents in the range 0.1 to 0.4, with the films deposited at lower O2/Ar ratios exhibiting the higher values.

Place, publisher, year, edition, pages
Elsevier, 2017. Vol. 247, 252-257 p.
Keyword [en]
Electrochromism impedance spectroscopy anomalous diffusion tungsten oxide
National Category
Materials Engineering
Research subject
Engineering Science with specialization in Solid State Physics
Identifiers
URN: urn:nbn:se:uu:diva-332918DOI: 10.1016/j.electacta.2017.06.079OAI: oai:DiVA.org:uu-332918DiVA: diva2:1154542
Available from: 2017-11-02 Created: 2017-11-02 Last updated: 2017-11-06

Open Access in DiVA

No full text

Other links

Publisher's full text

Search in DiVA

By author/editor
Green, SaraNiklasson, Gunnar A.
By organisation
Solid State Physics
In the same journal
Electrochimica Acta
Materials Engineering

Search outside of DiVA

GoogleGoogle Scholar

doi
urn-nbn

Altmetric score

doi
urn-nbn
Total: 16 hits
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • ieee
  • modern-language-association
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf